MetalsTek completed and shipped three Lu-based multicomponent oxide target formulations. This case compares their nominal compositions and explains the manufacturing considerations behind a custom research order.
Menu
MetalsTek completed and shipped three Lu-based multicomponent oxide target formulations. This case compares their nominal compositions and explains the manufacturing considerations behind a custom research order.
Introduction: Thin Film Failure in Extreme Environments and the Sputtering Dilemma In precision semiconductor fabrication, aerospace wear-resistant components, and high-performance medical implants, Diamond-Like Carbon (DLC) thin films serve as an indispensable barrier. These films are highly valued for their exceptional hardness, ultra-low coefficient of friction, chemical inertness, and high infrared transmittance. However, senior procurement managers […]
Introduction Nickel Iron alloys—often referred to as NiFe or Permalloy—have long been recognized as foundational materials in soft magnetics. As electronic devices continue to shrink in size while demanding higher precision and performance, the importance of magnetic thin films has grown significantly. From magnetic sensors embedded in automotive systems to advanced memory architectures, NiFe thin […]
MetalsTek Engineering is a leading manufacturer and supplier of Gold Sputtering Targets, designed for use in thin-film deposition processes. Gold Sputtering Targets Material: Gold, Au Purity: Au 99.99% Form: Disc, Plate, Rotatable Target, or Customized Sizes: Diameter 1″–14″ (25–350 mm); Thickness 2–10 mm; Rotatable targets available upon request Other: Dimensions, purity, and bonding (Cu/Ti backing […]
Introduction Molybdenum Rhenium (MoRe) sputtering targets occupy a unique and increasingly important position in advanced thin-film deposition technologies. By alloying molybdenum with a controlled amount of rhenium, the resulting material overcomes several intrinsic limitations of pure molybdenum—most notably brittleness, limited ductility at room temperature, and constraints in certain high-stress or high-temperature thin-film applications. MoRe sputtering […]
Indium Zinc Oxide (IZO) sputtering targets sit in a sweet spot of thin-film materials: they enable transparent, conductive oxide (TCO) coatings with solid optical transmission, low resistivity, and process flexibility across many PVD platforms. While Indium Tin Oxide (ITO) remains the “default” TCO in many supply chains, IZO has earned a long-term role in display, […]
MetalsTek Engineering is a trusted manufacturer and supplier of high-purity Carbon Sputtering Targets. We deliver consistent quality, competitive pricing, and short lead times to support a wide range of PVD thin-film deposition applications, including semiconductor devices, optical coatings, protective films, and DLC technologies. Carbon Sputtering Targets List C SiC B₄C WC Cr₃C₂ TiC ZrC NbC […]
The continued expansion of thin-film photovoltaics, optoelectronics, and high-performance coatings has made multi-component sputtering materials increasingly important to advanced manufacturing. Among these, Copper Indium Gallium (Cu/In/Ga) sputtering targets stand out as a central material for producing CIGS absorber layers, which remain one of the most efficient and versatile semiconductor systems in thin-film solar technology. This […]
Introduction Bismuth Antimony Telluride (Bi/Sb/Te) sputtering targets form the backbone of modern thermoelectric thin-film engineering. With outstanding electrical conductivity, low thermal conductivity, and tunable Seebeck behavior, Bi/Sb/Te alloys have enabled transformative progress in micro-cooling, energy harvesting, infrared detection, and next-generation semiconductor thermal management. The most widely adopted p-type formulation—Bi₀.₅Sb₁.₅Te₃—continues to lead the field due to […]
