Chromium Sputtering Targets

MetalsTek Engineering is a leading supplier of Chromium Sputtering Targets, including Planar and Rotary types. We offer competitive pricing and excellent lead times on all our materials, and we can supply custom materials per any specs/drawings you provide. Whether for chromium-specific applications or related sputtering targets, MetalsTek delivers unparalleled excellence in materials engineering, meeting the evolving demands of modern technology and innovation.

dd

Chromium Sputtering Target, Cr

%e5%9b%be%e7%89%871-1-png

Material: Chromium, 99.9%, 99.95%, 99.99%, 99.999%

Properties: Silvery Metallic, 1,857°C M.P., 7.2 g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Oxide Sputtering Target, CrO3 / Cr2O3

Chromium oxide sputtering target (CrO3 / Cr2O3) for advanced coating applications

Material: CrO3 / Cr2O3, 99.9%, 99.95%, 99.99%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Cr2O3 – Green Crystalline Solid, 2,266 Melting Point, RF, RF-R Sputter.

Chromium Aluminum Sputtering Target, Al/Cr

Chromium aluminum sputtering target (Al/Cr) used for thin film deposition in semiconductor applications.

Material: Aluminum Chromium, 99.9%, 99.95%

Properties: Gray, 660°C M.P., 5.5g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Cobalt Sputtering Target, Cr/Co

Chromium-Cobalt-Sputtering-Target

Material: Chromium Cobalt, 99.9%~99.99%

Properties: Silvery Metallic, 1,330°C M.P., 10g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Copper Sputtering Target, Cr/Cu, Cu/Cr

Chromium_Copper_Sputtering_Target

Material: Chromium Copper, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Molybdenum Sputtering Target, c

Chromium_Molybdenum_Sputtering_Target

Material: Chromium Molybdenum, 99.9%~99.99%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Nickel Sputtering Target, Cr/Ni, Ni/Cr

Chromium-Nickel-Sputtering-Target

Material: Chromium Nickel, 99.9%~99.95%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Titanium Sputtering Target, Cr/Ti

Chromium-Titanium-CrTi-Sputtering-Target

Material: Chromium Titanium, 99.9%~99.995%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Vanadium Sputtering Target, Cr/V, V/Cr

Chromium_Vanadium_Sputtering_Target

Material: Chromium Vanadium, 99.9% 

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium_Vanadium_Sputtering_Target

Material: Chromium Titanium, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Cobalt Nickel Chromium Sputtering Target, Co/Ni/Cr

Chromium_Vanadium_Sputtering_Target

Material: Cobalt Nickel Chromium Alloy, 99.9%~99.999%

Properties: Metallic, 9.7g/cc Density, 13 µm/m-K Thermal Expansion

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Cobalt Chromium Nickel High-Entropy (HEA) Sputtering Target, Co/Cr/Ni

Cobalt_Chromium_Nickel_High-Entropy__HEA__Sputtering_Target

Material: Cobalt Chromium Nickel Alloy, 99.9%~99.999%

Properties: Metallic, 9.7g/cc Density, 13 µm/m-K Thermal Expansion

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium

Nickel Chromium Aluminum Sputtering Target, Ni/Cr/Al

Chromium-Titanium-CrTi-Sputtering-Target

Material: Nickel Chromium Aluminum Alloy, 99.9%~99.95%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Silicon Chromium Sputtering Target, Si/Cr

Silicon_Chromium_Sputtering_Target

Material: Silicon Chromium, 99%~99.95%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Nickel Chromium Silicon Sputtering Target, Ni/Cr/Si

Nickel-Chromium-Silicon-Sputtering-Target

Material: Nickel Chromium Silicon, 99.9%~99.95%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Other Chromium Alloy Sputtering Target

Other_Chromium_Alloy_Sputtering_Target

Material: Ni/Cr/Fe, Fe/Cr/Ni(Stainless Steel), Co/Cr/Fe/Ni/Al, Co/Cr/Fe/Ni/Mn

Purity: 99.9~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Nitride Sputtering Target, Cr2N

Chromium_Nitride_Sputtering_Target-

Material: Chromium Nitride, 99.5%, 99.9%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Carbide Sputtering Target, Cr3C2

Chromium_Carbide_Sputtering_Target__1_-

Material: Chromium Carbide, 99.5%

Properties: Gray, 1,895°C M.P., 6.68g/cc Density, 180.01 M.W.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Fluoride Sputtering Target, CrF3

Chromium_Fluoride_Sputtering_Target__CrF3

Material: Chromium Fluoride, 99.9%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Silicide Sputtering Target, CrSi2

Chromium-Silicide-Sputtering-Target

Material: Chromium Silicide, 99.5%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium Recommended

Chromium Sulfide Sputtering Target, Cr2S3

Chromium-Sulfide-Sputtering-Target

Material: Chromium Sulfide, 99.9%

Properties: Brown to Black, 1,350°C M.P., 3.77g/cc Density, 200.19 M.W.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Boride Sputtering Target, CrB2

Chromium_Boride_Sputtering_Target

Material: Chromium Boride, 99.9%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Chromium Boride Sputtering Target, Cr5B3

Chromium_Boride_Sputtering_Target

Material: Chromium Boride, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Properties: Gray, 1,900°C M.P., 6.1 g/cc Density, 292.41 M.W.

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Bonding: Indium, Elastomer

Description

Chromium and Chromium-related Sputtering Targets are crucial in thin film deposition, specifically in the physical vapor deposition (PVD) domain. These targets are made from high-purity chromium metal and are the primary source for depositing chromium thin films onto various substrates. Chromium Sputtering Targets are engineered to meet strict quality standards, ensuring uniform composition and density, thus enabling consistent thin film deposition across the substrate surface. With excellent sputtering efficiency and superior adhesion properties, chromium thin films from these targets find various applications across industries, including electronics, optics, automotive, aerospace, and decorative coatings. Chromium Sputtering Targets are crucial for technological advancements and innovation, from corrosion-resistant coatings to reflective layers and electrical contacts.

MetalsTek Engineering is a leading supplier of Chromium Sputtering Targets, including Planar and Rotary types. We offer competitive pricing and excellent lead times on all our materials, and we can supply custom materials per any specs/drawings you provide. Whether for chromium-specific applications or related sputtering targets, MetalsTek delivers unparalleled excellence in materials engineering, meeting the evolving demands of modern technology and innovation.

Chromium Sputtering Targets Properties

Chromium is a popular metal that is known for its shiny appearance and resistance to corrosion. It has a high melting point, a specific gravity of 7.2, and a vapor pressure of 10-4 Torr at 1,157°C.  Chromium is used in the car industry to make shiny coatings on wheels and bumpers. It is also used in vacuum applications, such as making glass for cars, making solar cells, making batteries, and making shiny coatings that do not corrode.

Material TypeChromiumCoefficient of Thermal Expansion4.9 x 10^-6/K
SymbolCrTheoretical Density (g/cc)7.2
Atomic Weight51.9961Z Ratio0.305
Atomic Number24SputterDC
Color/AppearanceSilvery, MetallicMax Power Density (Watts/Square Inch)80
Thermal Conductivity94 W/m.KType of BondIndium, Elastomer
Melting Point (°C)1,857CommentsFilms very adherent

Custom Chromium Sputtering Targets for Your Unique Needs

Are you looking for the perfect layer? Trust our decades of experience and extensive database of chemical compositions and manufacturing processes. Our team is constantly improving our sputtering targets and arc cathodes to enhance the following material properties:

  • Grain size and microstructure
  • Ductility
  • Material hardness
  • Resistance to oxidation
  • Coefficient of friction
  • Temperature resistance
 
Contact us to customize our chromium mixture with additional elements to meet your specific needs.
chromium-targets-with-other-elements-webp

What Set Us Apart

cr-grain-3-e1713150015453-jpg
Unmatched Purity

We offer chromium and chromium-based sputtering targets in ultra-high purity forms, with purities up to 99.999%. These high purity levels ensure fewer defects in your films and coatings, resulting in superior quality for your final products.

high-purity-sputtering-target-metalstek-e1713149359814-png
Consistent & Durable

Our sputtering targets are designed to provide uniform deposition rates and consistent coating qualities. They are engineered to minimize particle generation during the sputtering process. Our targets are built to withstand rigorous sputtering conditions, offering extended life and reducing downtime, which improves operational efficiency.

Iridium crucible used in LED materials manufacturing, ensuring high purity and thermal stability during the synthesis process
Advanced Technological

Our chromium targets are designed for high-performance applications, utilizing advanced technologies and materials. We offer tailored compositions to meet your specific application requirements, guaranteeing the ideal solution for your sputtering needs.

e073caee7f114c26ac6b365995f4a327-webp
Exceptional Support

Our team of experts is ready to offer technical support and guidance to enhance your sputtering processes. With strategically placed stock locations across the globe, we guarantee fast and dependable delivery of our sputtering targets.

Chromium Sputtering Targets Application

Chromium is a versatile metal widely used in various industries due to its unique properties. Chromium Sputtering Targets, composed of pure chromium or chromium alloys, find extensive applications in thin film deposition processes, particularly in physical vapor deposition (PVD) techniques like magnetron sputtering and ion beam sputtering. Here are several critical applications of Chromium Sputtering Targets:

1. Decorative Coatings: Chromium coatings are renowned for their aesthetic appeal and corrosion resistance. They are commonly used in the automotive industry for decorative vehicle trim, such as door handles, bumpers, and grills. Chromium coatings are applied to household fixtures, faucets, and bathroom accessories for their shiny and durable finish.

2. Hard Coatings: Chromium coatings provide excellent hardness, wear resistance, and lubricity, making them suitable for applications requiring surface protection and durability. These coatings are used in cutting tools, molds, and industrial machinery components to enhance lifespan and performance under harsh operating conditions.

3. Optical Applications: Chromium thin films are employed in optical coatings because they can reflect visible light while transmitting infrared radiation. They are also utilized in architectural glass, solar control films, and mirrors for applications ranging from building insulation to automotive glazing and aerospace components.

4. Electronic Devices: Chromium Sputtering Targets are integral to fabricating semiconductor devices and electronic circuits. They deposit thin films as conductive layers, diffusion barriers, and interconnects in microelectronics, flat panel displays, and photovoltaic cells.

5. Wear and Corrosion Protection: Chromium coatings offer superior resistance to corrosion, oxidation, and chemical attack, making them suitable for protective coatings in harsh environments. They are applied to industrial equipment, aerospace components, and medical implants to mitigate wear and extend the service life of critical parts.

6. Tribological Applications: Chromium-based coatings exhibit low friction and high wear resistance, making them ideal for tribological applications such as bearings, shafts, and sliding surfaces. These coatings reduce frictional losses, improve energy efficiency, and enhance the performance of mechanical systems.

7. Barrier Layers: Chromium is often used as a barrier layer in multilayer thin-film structures to prevent the diffusion of contaminants and maintain the integrity of underlying layers. In semiconductor manufacturing, chromium is a diffusion barrier between copper and silicon to prevent copper migration and ensure device reliability.

Packaging

Our Chromium Sputtering Targets are clearly labeled externally to ensure efficient identification and quality control. To prevent any damage during storage or transportation, we take great care.

Chromium and Cr-Based Sputtering Targets-Unveiling the Essentials

In today’s fast-paced world of technology and industry, materials like chromium and chromium-based sputtering targets play a crucial role. These materials are essential for thin film deposition processes, which have transformed industries like electronics and aerospace. But what are sputtering targets, and why is chromium so important for these advanced applications?

Table of Contents

Chapter 1

What Are Sputtering Targets Used For?

Sputtering targets are essential materials used in a sputtering process to deposit thin films of one material onto another. This is done by sputtering atoms out of the target material and onto a substrate. This technique is widely used in manufacturing processes across various industries, such as semiconductors, solar panels, and protective coatings.

lead-sputtering-target-2-png

Chapter 2

What are Chromium Sputtering Targets

Chromium sputtering targets are in high demand because they have some really cool properties. Chromium is a transition metal that has a high melting point, is tough, and doesn’t tarnish. It’s great for making films that are both tough and conductive. It’s also great for making things that need to be really precise and last a long time.

As a hard material layer, chromium (Cr) and chromium nitride (CrN) protect engine components such as piston rings optimally against rapid wear and thereby extend the service life of important components. For other components, such as bucket tappets, chromium is used as an adhesive layer for the DLC (Diamond Like Carbon) coating. Our chromium can also be used as a decorative layer on watches, electronic items, control elements, and many other products to give a brilliant shine.

Chapter 3

Chromium-Based Sputtering Targets: An Overview

Pure chromium targets are commonly used, but there are also chromium-based alloys and compounds, such as chromium nitride or chromium oxide, that are used for specific purposes in different applications. These chromium-based targets have specific properties, like increased hardness or specific electrical characteristics, that are important for certain industrial applications.

Chapter 4

Applications of Chromium and Cr-Based Sputtering Targets

Chromium sputtering targets are used in a variety of applications, from smartphones to spacecraft. They play a critical role in semiconductor manufacturing by creating barrier layers and conductive paths. In the automotive industry, sputtered chromium coatings improve the durability and corrosion resistance of components.

Chapter 5

The Production Process of Chromium and Chromium-Based Targets

When it comes to making chromium sputtering targets, there are a few key steps that need to be followed to make sure you get the best results. First, you start with raw chromium. Then, you melt it down and mix it with other stuff if you need to. Finally, you shape it into targets. It’s really important to be super careful and pay close attention to each step so that you get the right kind of thin films in the end.

Processes of how to produce sputtering targets:

1-capabilities_01-jpg
1-capabilities_04-jpg
1-capabilities_05-jpg
durable-sputtering-target-500x500-1-webp
cr-grain-3-e1713150015453-jpg
1-capabilities_03-jpg
istockphoto-896359458-jpg
planar-titanium-ti-sputtering-target-1-removebg-preview-png

Chapter 6

How to Select the Right Sputtering Target? And Chromium Target?

When it comes to choosing the right chromium sputtering target, there are a few key factors to consider. First and foremost, you need to think about the specific requirements of your application. This includes things like the purity of the target, the composition of the alloy, and the properties you want your film to have.

At MetalsTek, we understand that every application is different. That’s why we offer a wide range of options and can even customize our targets to meet your specific needs. We’ve been in the business for over 20 years, so you can trust us to help you find the right target for your application.

When it comes to choosing the right sputtering target material, there are a few things you need to consider. First and foremost, you need to think about the specific requirements of your application. This includes things like the electrical, optical, and mechanical properties of the thin films you want to create. These properties can vary widely depending on the application, so it’s important to choose a target material that will give you the results you’re looking for.

In addition to the material properties and application requirements, you also need to think about things like cost-effectiveness, equipment compatibility, and the sputtering method you plan to use.

This alignment is vital for achieving the desired film properties and ensuring that the target supports stable deposition, especially in applications where conductivity and the reduction of trace impurities are critical, such as in semiconductor and conductive film applications.

Chapter 7

MetalsTek: Your Trusted Partner for Chromium Sputtering Targets

At MetalsTek, we take great pride in providing top-notch chromium and chromium-based sputtering targets that meet the demanding requirements of today’s industries. Our dedication to quality, coupled with our capability to tailor targets to precise sizes and compositions, positions us as the go-to choice for businesses looking to push boundaries and achieve greatness.

Chapter 8

Conclusion

chromium_plates-removebg-preview-png

Without materials like chromium in sputtering targets, we wouldn’t have the technology and industry advancements we have today. As we continue to push the boundaries of what’s possible, choosing the right sputtering target becomes even more important. MetalsTek is here to help you with that. We provide the materials that will shape the future.

Do you want to improve your products with high-quality chromium or chromium-based sputtering targets? Contact MetalsTek today. Let’s talk about how we can meet your needs and help you move your technology forward.

Request A Quote
Attach a Drawing
*Company e-mail address is preferred.