Lead Sputtering Target

MetalsTek Engineering’s commitment to quality craftsmanship and innovation ensures that its Lead Sputtering Targets meet the highest standards of performance and reliability.

Lead Sputtering Target, Pb

Lead Sputtering Target, Pb

Material: Lead, >99.99%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Lead Oxide Sputtering Target, PbO

Lead Oxide Sputtering Target, PbO

Material: Lead Oxide

Purity: 99.9% ~ 99.99%

Properties: 9.53g/cc Density, ≈888°C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Lead Sulfide Sputtering Target, PbS

Lead Sulfide Sputtering Target, PbS

Material: Lead Sulfide

Purity: 99.9% ~ 99.999%

Properties: 7.6g/cc Density, ≈1,118°C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Lead Telluride Sputtering Target, PbTe

lead-telluride-sputtering-target-pbte

Material: Lead Telluride

Purity: 99.9% ~ 99.999%

Properties: 6.14g/cc Density, ≈924°C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Lead Selenide Sputtering Target, PbSe

Lead Selenide Sputtering Target, PbSe

Material: Lead Selenide

Purity: 99.9% ~ 99.999%

Properties: 8.1g/cc Density, 1,078°C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Lead Titanate Sputtering Target, PbTiO3

Lead Titanate Sputtering Target, PbTiO3

Material: Lead Titanate

Purity: 99.9%

Properties: 7.3g/cc Density, 1,540°C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Lead Zirconate Sputtering Target, PbZrO3

Lead Zirconate Sputtering Target, PbZrO3

Material: Lead Zirconate

Purity: 99.9%

Properties: 7.2g/cc Density, 1,390°C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Lead Zirconium Titanate Sputtering Target, PZT

lead-zirconium-titanate-sputtering-target-pzt

Material: PbZr0.52Ti0.48O3

Purity: 99.9%

Properties: 7.5g/cc Density, ≈1,250°C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Lead Zirconate Titanate With Niobium Sputtering Target

Lead Zirconate Titanate With Niobium Sputtering Target

Material: PbZr0.52Ti0.48O3-Nb

Purity: 99.9% ~ 99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~12” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Lead Calcium Titanate Sputtering Target

Lead Calcium Titanate Sputtering Target

Material: Pb0.7Ca0.3TiO3

Purity: 99.9% ~ 99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~12” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Lead Selenide Telluride Sputtering Target, Pb/Se/Te

Lead Selenide Telluride Sputtering Target,

Material: Lead Selenide Telluride

Purity: 99% ~ 99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~12” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Lead Platinum Sputtering Target, Pb/Pt

Lead Platinum Sputtering Target,

Material: Lead Platinum

Purity: 99% ~ 99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~12” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Lead Fluoride Sputtering Target, PbF2

Lead Fluoride Sputtering Target, PbF2

Material: Lead Fluoride

Purity: 99.9% ~ 99.99%

Properties: 8.445g/cc Density, ≈824°C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~12” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25

Lead Antimonide Sputtering Target, PbSb

lead-antimonide-sputtering-target-pbsb

Material: Lead Antimonide

Purity: 99.9% ~ 9999%

Properties: 6.72g/cc Density, 328.94 M.W.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~12” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25

Bonding: Indium, Elastomer

Lead Arsenide Sputtering Target, PbAs

Lead Zirconate Titanate With Niobium Sputtering Target

Material: Lead Arsenide

Purity: 99.9% ~ 9999%

Properties: Gray, 282.12M.W.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~12” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25

Bonding: Indium, Elastomer

Description

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Lead and Lead-based Sputtering Targets are essential components used in physical vapor deposition processes to deposit lead thin films onto substrates. Composed of high-purity lead or lead alloys, these targets are employed in industries such as electronics, optics, and surface engineering. In semiconductor manufacturing, lead thin films serve various functions including as interconnects, passivation layers, and barrier layers in integrated circuits. In optical coatings, lead-based thin films enhance optical properties such as reflectivity and transmission, while in surface engineering applications, they provide corrosion protection and decorative finishes. Maintaining high purity levels in Lead Sputtering Targets is crucial for achieving reproducible and high-quality thin film coatings, and safety precautions must be observed due to the potential health and environmental hazards associated with lead exposure. Lead and lead-based sputtering targets play a vital role in thin film deposition processes, facilitating the fabrication of functional coatings and devices across a range of industries.

Lead(Pb) Specifications

Material Type

Lead

E-Beam

Excellent

Symbol

Pb

Thermal Evaporation Techniques

Boat: W, Mo

Atomic Weight

207.2

Coil: W

Atomic Number

82

Basket: W, Ta

Appearance

Bluish White, Metallic

Crucible: Al2O3, Q

Thermal Conductivity

35 W/m.K

E-Beam Crucible Liner Material

FABMATE®

Melting Point

328°C

Temp. (°C) for Given Vap. Press. (Torr)

10-8: 342

Coefficient of Thermal Expansion

28.9 x 10-6/K

10-6: 427

Theoretical Density

11.34g/cc

10-4: 497

Z Ratio

1.13

Suggested QCM Crystal

Gold Crystal

Applications

lead-sputtering-target-2

The applications of Lead and Lead-based Sputtering Targets are diverse and crucial in various industries. Here are some key applications based on the provided sources:

  1. Semiconductor Industry:Lead Sputtering Targets are used in the semiconductor industry for thin film deposition processes, aiding in the production of electronic components and devices.
  2. Optical Coatings:Lead-based Sputtering Targets find applications in creating optical coatings for lenses, mirrors, and other optical components.
  3. Research and Development:Lead Sputtering Targets are utilized in research and development settings for exploring new materials and advancing technological innovations.
  4. Decorative Coatings:Lead-based Sputtering Targets are employed in producing decorative coatings with specific properties for various applications.
  5. Magnetic Thin Films:Lead Sputtering Targets play a role in depositing magnetic thin films used in magnetic storage media and other magnetic applications.
  6. Biomedical Applications:Lead and Lead-based Sputtering Targets may have specialized applications in biomedical fields, although caution is necessary due to lead’s toxicity.

These applications highlight the importance of lead and lead-based sputtering targets in industries like semiconductors, optics, research, decorative coatings, magnetic materials, and potentially biomedical fields.

Packaging

Our Lead Sputtering Targets are clearly labeled externally to ensure efficient identification and quality control. We take great care to prevent any damage during storage or transportation.

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