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Niobium Sputtering Targets

MetalsTek Engineering is a trusted supplier of Niobium Sputtering Targets, collaborating with global partners to deliver products of the utmost quality at competitive prices. 

Out of the standard sizes of targets(Diameter 1″~6″ * Thick. 0.125″&0.25″), we can also manufacture according to your need. 

Niobium Sputtering Target (DC Sputter)

Niobium Sputtering Target (DC Sputter)

Material: Niobium, Nb

Purity: 99%~99.999%

Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape

Size Range: Disc – Diameter 10~400mm, Thick 2~28mm

           Plate – Thick 3~30mm, Width 50~400mm, Length 50~400mm

Other: Purity, Shape, Size, and Bonding Can be Customized

Basic Information

Basic Information

Material TypeNiobiumCoefficient of Thermal Expansion7.3 x 10-6/K
Atomic Weight92.90638Z Ratio0.492
Density8.3 g/ccSputterDC
Color/AppearanceGray, MetallicMax Power Density*100 Watts/Square Inch
Thermal Conductivity54 W/m.KBondingIndium, Elastomer
Melting Point2,468°CCommentsAttacks W Source

Niobium Grades (Impurities ppm)

GradeNb+Ta≥%FeSiMoWTiCrTaNiOCHN
Nb399.9202080100101010002025010015150
Nb299.951010505055500102005010100
Nb199.99551020111001100301050

Niobium Titanium Sputtering Target

Niobium Sputtering Target (DC Sputter)

Material: Niobium Titanium, Nb/Ti

Purity: 99%~99.999%

Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape

Size Range: Disc – Diameter 10~400mm, Thick 2~28mm

           Plate – Thick 3~30mm, Width 50~400mm, Length 50~400mm

Other: Purity, Shape, Size, and Bonding Can be Customized

Basic Information

Niobium Titanium Sputtering Target is a material used in sputtering, a technique widely employed in thin-film deposition. Sputtering is ejecting atoms or ions from a solid target material through bombardment with high-energy particles, usually ions. The ejected particles are then deposited onto a substrate to form a thin film.

Niobium Titanium Sputtering Target Specifications

Compound FormulaTi/Nb
AppearanceGray metallic target
Molecular Weight140.773
Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″; Thick.: 0.125″, 0.250″

Niobium Alloy Sputtering Targets

Niobium Sputtering Target (DC Sputter)

Material: Niobium Alloys, Mo/Nb, W/Nb, Nb3Sn, Co/Nb/Zr, etc.

Purity: 99%~99.999%

Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape

Size Range: Disc – Diameter 10~400mm, Thick 2~28mm

Plate – Thick 3~30mm, Width 50~400mm, Length 50~400mm

Other: Purity, Shape, Size, and Bonding Can be Customized

Niobium Oxide Sputtering Target

Niobium_Oxide_Sputtering_Target

Material: Niobium Oxide, Nb2O5

Purity: 99.9%, 99.95%

Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape

Standard Size: Diameter 1”, 2”, 3”, 4”, 5”, 6”; Thick 0.125”, 0.25”

Other: Purity, Shape and Size Can be Customized

Niobium Sulfide Sputtering Target

Niobium_Sulfide_Sputtering_Target

Material: Niobium Sulfide, NbS

Purity: 99.9%, 99.95%

Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape

Standard Size: Diameter 1”, 2”, 3”, 4”, 5”, 6”; Thick 0.125”, 0.25”

Other: Purity, Shape and Size Can be Customized

Niobium Nitride Sputtering Target

Niobium_Nitride_Sputtering_Target

Material: Niobium Nitride, NbN

Purity: 99.9%, 99.95%

Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape

Standard Size: Diameter 1”, 2”, 3”, 4”, 5”, 6”; Thick 0.125”, 0.25”

Other: Purity, Shape and Size Can be Customized

Other Niobium Sputtering Targets

Other Niobium Sputtering Targets

Material: Niobium Related

Composition: Mo/Nb, LaNbO3, NbTe2, NbSi2, NbSe2, Nb3Sn, Nb/Ti, NbB2, Co/Nb/Zr, BaNbO3

Purity: 99%~99.99%

Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape

Standard Size: Diameter 1”, 2”, 3”, 4”, 5”, 6”; Thick 0.125”, 0.25”

Other: Purity, Shape and Size Can be Customized

Description

A Niobium Sputtering target is a specialized material used in sputter deposition. It is commonly employed in thin-film coating applications such as fuel cells, decoration, semiconductors, displays, LEDs, and photovoltaics. Niobium, a transition metal, exhibits properties suitable for use as a sputtering target in various industries.

The niobium sputtering tagets include Nb, Nb2O5, Mo/Nb, W/Nb, LaNbO3, NbTe2, NbSi2, NbSe2, Nb3Sn, NbN, Nb/Ti, NbS, NbB2, Co/Nb/Zr, BaNbO3, and More.

We supply Niobium Sputtering Targets in many shapes: disc, plate, column, rotary targets, and step targets. Target Bonding Service is also available.

Rotatory Target VS. Planar Target

When comparing rotatory targets with planar targets, it is evident that rotatory targets offer several advantages. They contain more material, leading to greater utilization, longer production runs, and reduced system downtime, thereby increasing the throughput of the coating equipment. Additionally, the use of higher power densities is enabled due to the even spread of heat build-up over the surface area of the target. This results in increased deposition speed and improved performance during reactive sputtering.

Applications of Niobium Sputtering Targets

Some key applications of niobium and niobium-related sputtering targets include:

Niobium Sputtering Targets are available in various forms, purities, sizes, and prices, and can be customized according to specific application requirements.

Packaging

Our Niobium Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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*e-mail address with your company's domain name is preferred.