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Vanadium Sputtering Targets

MetalsTek Engineering is a leading company in Vanadium Sputtering Targets, showcasing unparalleled expertise and innovation in thin film deposition processes. Their targets contribute to advancements in various industries.

Vanadium Sputtering Target, V

Vanadium Sputtering Targets

Material: Vanadium

Purity: 99.5%, 99.9%, Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Bonding: Indium, Elastomer

Chemical Compositions of Vanadium Sputtering Target

The adaptability of our production process enables the fine-tuning of the microstructure in our coating material, ensuring the desired effect is achieved. When the grains of the sputtering target are consistently aligned, users can experience consistent erosion rates and the formation of uniform layers.

Our produced sputtering targets boast high purity, offering significant advantages. The films derived from these targets exhibit exceptional electrical conductivity and undergo minimal particle formation during the PVD process. Enclosed is the formal Certificate of Analysis for the 99.9% high-purity Vanadium Sputtering Target (ppm):

ContentValueContentValueContentValue
VBalanceO20Cd20
Mg20N20Sn20
Al20S20Sb20
K10Cu100Ta50
Ca10Zn50W50
Cr50As20Pb20
Mn50Zr20Bi20
Fe100Mo50Tl10
Co100C20

Vanadium Oxide Sputtering Target, VO2 / V2O3 / V2O5 / BiVO4 / CaVO3

Vanadium_Oxide_Sputtering_Targetv2o3

Material: Vanadium Oxide, VO2 / V2O3 / V2O5 / BiVO4 / CaVO3

Purity: 99.9%~99.999%, Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Bonding: Indium, Elastomer

Vanadium Carbide Sputtering Target, VC

Vanadium Carbide Sputtering TargetVC

Material: Vanadium Carbide, VC

Purity: 99.5%, Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Bonding: Indium, Elastomer

Vanadium Nitride Sputtering Target, VN

Vanadium Nitride Sputtering TargetVN

Material: Vanadium Nitride, VN

Purity: 99.5%, 6.13g/cc

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Bonding: Indium, Elastomer

Nickel Vanadium Sputtering Target, Ni/V

Nickel_Vanadium_Sputtering_TargetNIV

Material: Nickel Vanadium, Ni/V

Purity: 99.9%, 1,775°C~1,875°C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Main Application: Thin Film Deposition, Decoration, LED, Display, Semiconductor, Glass Coating

Vanadium Titanium Sputtering Target, V/Ti

Vanadium Titanium Sputtering Target VTi

Material: Vanadium Titanium, V/Ti

Purity: 99.9%, Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Main Application: Thin Film Deposition, Decoration, LED, Display, Semiconductor, Glass Coating

Vanadium Chromium Sputtering Target, V/Cr, Cr/V

Vanadium_Chromium_Sputtering_TargetVCr_CrV

Material: Vanadium Chromium, V/Cr, Cr/V

Purity: 99.9%, Composition Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Main Application: Thin Film Deposition, Decoration, LED, Display, Semiconductor, Glass Coating

Vanadium Tungsten Sputtering Target, V/W

Vanadium_Tungsten_Sputtering_Target_VW

Material: Vanadium Tungsten, V/W

Purity: 99.9%, Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Main Application: Thin Film Deposition, Decoration, LED, Display, Semiconductor, Glass Coating

Vanadium Aluminum Sputtering Target, V/Al

Vanadium_Aluminum_Sputtering_Target_V-Al

Material: Vanadium Aluminum, V/Al, CAS# 39458-13-4

Purity: 99.9%, Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Main Application: Thin Film Deposition, Decoration, LED, Display, Semiconductor, Glass Coating

Vanadium Boride Sputtering Target, VB2

Vanadium_Aluminum_Sputtering_Target_V-Al

Material: Vanadium Boride, VB2

Purity: 99.9%, 99.95%, 99.99%, 5.1g/cc

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Main Application: Thin Film Deposition, Decoration, LED, Display, Semiconductor, Glass Coating

Titanium Aluminum Vanadium Sputtering Target, Ti/Al/V

Titanium_Aluminum_Vanadium_Sputtering_Target_TiAlV

Material: Titanium Aluminum Vanadium, Ti/Al/V

Purity: 99.9%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Main Application: Thin Film Deposition, Decoration, LED, Display, Semiconductor, Glass Coating

Cobalt Nickel Vanadium High-Entropy Alloy (HEA) Sputtering Target, Co/Ni/V

Vanadium_Aluminum_Sputtering_Target_V-Al

Material: Cobalt Nickel Vanadium, Co/Ni/V

Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Size: Round – Diameter < 14inch, Thickness > 1mm

Rectangular – Length < 32inch, Width < 12inch, Thickness > 1mm

Main Application: Electronic Devices, Photovoltaic Cells, and Coatings

Description

Vanadium Sputtering Targets are used in sputtering, a proven technology capable of depositing thin films from a wide variety of materials onto diverse substrates. These targets are made from high-purity vanadium, vanadium compounds or vanadium alloys, and are available in various sizes, thicknesses, and purities to suit different applications. Additionally, vanadium-related sputtering targets may include compounds or alloys that involve vanadium, expanding their applications.

Some key specifications and properties of Vanadium Sputtering Targets include:

Applications and Features

The selection of a particular sputtering target depends on the specific requirements of the thin film application, and the desired properties of the deposited films determine the choice between pure vanadium or vanadium-related compounds.

Vanadium Sputtering Targets Packaging

Our Vanadium Sputtering Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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