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MetalsTek Engineering is a leading manufacturer and supplier of high-quality flat and rotary Molybdenum Sputtering Targets. We offer Sputtering Targets in different shapes and sizes upon request. Feel free to Get A Quote if you need any of the targets.
Material: Molybdenum (Mo)
Purity: 99%, 99.5%, 99.9%, 99.95%
Size Range: Disc – Dia.10~360mm * Thick 1~10mm
Planar – Thick 1~10mm * Width 20~600mm * Length 20~2,000mm
Rotary – OD 20~400mm * Length 100~300mm, Wall Thick 1~30mm
Standard Sizes: Diameter 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″, 8.0”; Thick: 0.125″, 0.250″, Can be Customized
Material: Molybdenum Carbide (Mo2C)
Purity: 99%, 99.5%, 99.9%
Shape: Disc, Bar, Rotary, Can be Customized
Size: Diameter 1.0″, 2.0″, 3.0″, 4.0″; Thick: 0.125″, 0.250″, Can be Customized
Material: Molybdenum Disilicide (MoSi2)
Purity: 99%, 99.5%, 99.9%
Shape: Disc, Bar, Rotary, Can be Customized
Size: Diameter 1.0″, 2.0″, 3.0″, 4.0″; Thick: 0.125″, 0.250″, Can be Customized
Material: Molybdenum Disulfide (MoS2)
Purity: 99.5%, 99.9%, 99.95%
Shape: Disc, Bar, Rotary, Can be Customized
Standard Sizes: Diameter 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″, 8.0”; Thick: 0.125″, 0.250″, Can be Customized
Material: Molybdenum Oxide (MoO3)
Purity: 99.5%, 99.9%, 99.95%
Shape: Disc, Bar, Rotary, Can be Customized
Size: Diameter 1.0″, 2.0″, 3.0″, 4.0″; Thick: 0.125″, 0.250″, Can be Customized
Material: Molybdenum/Rhenium (Mo/Re)
Composition: 60Mo:40Re, 50Mo:50Re
Purity: 99.95%
Shape: Disc, Bar, Rotary, Can be Customized
Size: Diameter 1.0″, 2.0″, 3.0″, 4.0″; Thick: 0.125″, 0.250″, Can be Customized
Material: Mo/Nb, Mo/Cr, MoTe2, MoSe2, Mo2B5
Purity: 99%, 99.5%, 99.9%, 99.95%, 99.99%, 99.999%
Shape: Disc, Bar, Rotary, Can be Customized
Size: Customized
A molybdenum sputtering target is a specialized material used in physical vapor deposition (PVD), specifically sputtering. Sputtering is a technique where atoms or molecules from a solid target material are ejected and then deposited onto a substrate to form a thin film. Molybdenum sputtering targets are designed for applications in which a thin layer of molybdenum is needed on a substrate, such as in producing semiconductor devices, solar cells, and thin-film coatings.
Sputtering Target: Mo, Mo/Re, Mo/Nb, Mo/Cr, MoTe2, MoSe2, Mo2B5, Mo2C, MoO3, MoSi2, MoS2
Target Type: Disc, Planar, Rotary, Customized
Size: Customized
Back Bonding: Indium, Elastomer
When comparing rotatory targets with planar targets, it is evident that they offer several advantages. They contain more material, leading to greater utilization, longer production runs, and reduced system downtime, thereby increasing the throughput of the coating equipment. Additionally, higher power densities are enabled due to the even spread of heat build-up over the surface area of the target. This results in increased deposition speed and improved performance during reactive sputtering.
Applications of Molybdenum Sputtering Targets include the deposition of molybdenum thin films for:
The controlled deposition of molybdenum through sputtering targets is essential in various industries where precise and high-quality thin films are required for specific applications.
Our Molybdenum Sputtering Targets are carefully handled and packed to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.