Molybdenum Sputtering Target

MOLYBDENUM · COMPOUNDS · CUSTOM TARGETS

Molybdenum Sputtering Targets

Specify elemental Mo, a Mo-based alloy or a compound target for your thin-film deposition process. Compare material options, review dimensions and bonding needs, or select an existing target configuration below.

Planar & rotary geometries · Material-specific specifications · Drawing-based enquiries

High-purity molybdenum sputtering target for advanced thin film deposition applications

Choose the Target Material

Start with the required chemistry, then confirm dimensions, purity basis and acceptance criteria. The ranges below describe catalogue options; selected ordering configurations can have different grade-specific specifications.

High-purity molybdenum sputtering target for advanced thin film deposition applications

Mo · Molybdenum

Catalogue purity: 99–99.95%
Options: Disc, planar and rotary

Molybdenum-Carbide-Sputtering-Target-Mo2C

Mo₂C · Molybdenum Carbide

Catalogue purity: 99–99.9%
Options: Disc, bar and rotary

Molybdenum Disilicide Sputtering Target, MoSi2

MoSi₂ · Molybdenum Disilicide

Catalogue purity: 99–99.9%
Options: Disc, bar and rotary

Molybdenum Disulfide Sputtering Target, MoS2

MoS₂ · Molybdenum Disulfide

Catalogue purity: 99.5–99.95%
Options: Disc, bar and rotary

MoTe2 Target Made by MetalsTek1

MoTe₂ · Molybdenum Ditelluride

Catalogue purity: 99.5–99.95%
Options: Disc, bar and rotary

MoSe2 Sputtering Targets Produced by MetalsTek

MoSe₂ · Molybdenum Diselenide

Catalogue purity: 99.5–99.95%
Options: Disc, bar and rotary

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MoO₃ · Molybdenum Trioxide

Catalogue purity: 99.5–99.95%
Options: Disc, bar and rotary

Mo/Re · Molybdenum Rhenium

Catalogue purity: 99.95%
Options: 60Mo:40Re or 50Mo:50Re

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Custom · Other Mo-Based Targets

Catalogue purity: Grade-specific
Options: Mo/Nb, Mo/Cr, Mo₂B₅ and other requested compositions

Catalogue purity is not a batch test result. State critical impurity limits and the required documentation in your enquiry. Custom geometries and listed material options are subject to technical review.

Available Target Configurations

Select a material and configuration to view the listed specifications and price. Reference photos show material examples; the selector defines the ordering configuration. For another composition, grade, geometry or bonding arrangement, request a custom quotation.

High-purity molybdenum sputtering target for advanced thin film deposition applications

Elemental Molybdenum

Molybdenum Disulfide Sputtering Target, MoS2

Molybdenum Disulfide · MoS₂

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Molybdenum Trioxide · MoO₃

Molybdenum Rhenium · Mo/Re

MoTe2 Target Made by MetalsTek1

Molybdenum Ditelluride · MoTe₂

Dimensions & Material Specifications

Use the details below as a starting point for your drawing and RFQ. Confirm dimensions, tolerances, purity and any backing plate or bonding requirements for the selected material before ordering.

ParameterPublished option / requirement
Material:Molybdenum (Mo)
Purity:99%, 99.5%, 99.9%, 99.95%
Size Range:Disc – Dia.10~360mm * Thick 1~10mm
Planar – Thick 1~10mm * Width 20~600mm * Length 20~2,000mm
Rotary – OD 20~400mm * Length 100~300mm, Wall Thick 1~30mm
Standard Sizes:Diameter 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″, 8.0”; Thick: 0.125″, 0.250″, Can be Customized
ParameterPublished option / requirement
Material:Molybdenum Carbide (Mo2C)
Purity:99%, 99.5%, 99.9%
Shape:Disc, Bar, Rotary, Can be Customized
Size:Diameter 1.0″, 2.0″, 3.0″, 4.0″; Thick: 0.125″, 0.250″, Can be Customized
ParameterPublished option / requirement
Material:Molybdenum Disilicide (MoSi2)
Purity:99%, 99.5%, 99.9%
Shape:Disc, Bar, Rotary, Can be Customized
Size:Diameter 1.0″, 2.0″, 3.0″, 4.0″; Thick: 0.125″, 0.250″, Can be Customized
ParameterPublished option / requirement
Material:Molybdenum Disulfide (MoS2)
Purity:99.5%, 99.9%, 99.95%
Shape:Disc, Bar, Rotary, Can be Customized
Standard Sizes:Diameter 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″, 8.0”; Thick: 0.125″, 0.250″, Can be Customized
ParameterPublished option / requirement
Material:Molybdenum Telluride (MoTe2)
Purity:99.5%, 99.9%, 99.95%
Shape:Disc, Bar, Rotary, Can be Customized
Standard Sizes:Diameter 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″, 8.0”; Thick: 0.125″, 0.250″, Can be Customized
ParameterPublished option / requirement
Material:Molybdenum Selenide (MoSe2)
Purity:99.5%, 99.9%, 99.95%
Shape:Disc, Bar, Rotary, Can be Customized
Standard Sizes:Diameter 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″, 8.0”; Thick: 0.125″, 0.250″, Can be Customized
ParameterPublished option / requirement
Material:Molybdenum Oxide (MoO3)
Purity:99.5%, 99.9%, 99.95%
Shape:Disc, Bar, Rotary, Can be Customized
Size:Diameter 1.0″, 2.0″, 3.0″, 4.0″; Thick: 0.125″, 0.250″, Can be Customized
ParameterPublished option / requirement
Material:Molybdenum/Rhenium (Mo/Re)
Composition:60Mo:40Re, 50Mo:50Re
Purity:99.95%
Shape:Disc, Bar, Rotary, Can be Customized
Size:Diameter 1.0″, 2.0″, 3.0″, 4.0″; Thick: 0.125″, 0.250″, Can be Customized
ParameterPublished option / requirement
Material:Mo/Nb, Mo/Cr, MoTe2, MoSe2, Mo2B5
Purity:99%, 99.5%, 99.9%, 99.95%, 99.99%, 99.999%
Shape:Disc, Bar, Rotary, Can be Customized
Size:Customized

Planar, Rotary & Bonded Target Assemblies

Choose a Compatible Geometry

Planar targets include discs and rectangular plates. Rotary targets require dimensions and interfaces matched to the sputtering source. Target utilisation, cooling and usable power depend on source design, erosion pattern and operating conditions; geometry alone does not guarantee a performance improvement.

Define the Bonding Requirement

Include the backing plate material, dimensions, drawing and operating conditions when requesting a bonded assembly. Indium and elastomer bonding options require a material- and application-specific review.

Additional Target Views

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MoSe2 Sputtering Targets Produced by MetalsTek

Applications & Handling

Elemental molybdenum thin films are used in semiconductor devices, photovoltaic structures, thin-film resistors, optical coatings and barrier layers. Compound and alloy targets serve different film chemistries; select the material and deposition process against your intended film specification.

Targets are handled and packed for storage and transport. Confirm packing quantity, surface protection and any moisture- or atmosphere-sensitive handling requirements for the chosen material.

Molybdenum Target FAQ

Send the chemical formula or alloy ratio, purity basis, critical impurity limits, dimensions, tolerances and quantity. Include a drawing for nonstandard geometry.

Provide the target and backing plate drawings, plate material, bonding preference and operating conditions. Suitability is reviewed for the proposed assembly.

No. Sputtering conditions, substrate conditions and the behaviour of different elements can affect the deposited film. Establish film composition and performance through your own process evaluation.

Include material, composition, purity and impurity requirements, shape, dimensions, quantity, backing plate and bonding needs, documentation, delivery destination and requested lead time.

Related Resources

A practical starting point for specifying target composition, geometry, purity, backing, bonding, and deposition conditions.

Define the composition basis clearly when requesting alloy or compound targets, including Mo-Re and other custom Mo-based materials.

Application background for the Mo-Re target family listed on this page, alongside elemental and compound target options.

Prepare Your Molybdenum Target Inquiry

Send the material or composition, drawing, target dimensions, purity requirements and quantity. Add backing plate and bonding details where required.

Request a Quote

Tell us what you need. A drawing or specification will help us review your project more efficiently.
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