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Nickel Sputtering Targets

Nickel Sputtering Target, Ni

Nickel Sputtering Target, Ni

Material: Nickel, Ni

Purity: 99.9%~99.995%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Aluminum Nickel Sputtering Target, Al/Ni

Aluminum Nickel Sputtering Target,

Material: Aluminum Nickel Alloy

Purity: 99.9%~99.99% Composition Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Chromium Nickel Sputtering Target, Cr/Ni Ni/Cr

Chromium Nickel Sputtering Target

Material: Chromium Nickel Alloy

Purity: 99.9%~99.95%, Composition Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Cobalt Nickel Sputtering Target, Co/Ni

Cobalt Nickel Sputtering Target

Material: Cobalt Nickel Alloy

Purity: 99.9%~99.99%, Composition Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Copper Nickel Sputtering Target, Cu/Ni Ni/Cu

copper_nickel_sputtering_target-removebg-preview

Material: Copper Nickel Alloy

Purity: 99.9%~99.999%, Composition Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Iron Nickel Sputtering Target, Fe/Ni Ni/Fe

iron-nickel-sputtering-target

Material: Iron Nickel Alloy, 99.9%~99.99%

Composition: Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Manganese Nickel Sputtering Target, Mn/Ni

manganese-nickel-sputtering-target

Material: Manganese Nickel Alloy, 99.9%~99.99%

Composition: Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Nickel Chromium Aluminum Sputtering Target, Ni/Cr/Al

Nickel Chromium Aluminum Sputtering Target

Material: Nickel Chromium Aluminum, 99.9%~99.95%

Composition: Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Nickel Chromium Silicon Sputtering Target, Ni/Cr/Si

Nickel Chromium Silicon Sputtering Target

Material: Nickel Chromium Silicon, 99.9%~99.95%

Composition: Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Nickel Titanium Sputtering Target, Ni/Ti Ti/Ni

Nickel Titanium Sputtering Target

Material: Nickel Titanium Alloy, 99.9%~99.99%

Composition: Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Nickel Tungsten Sputtering Target, Ni/W

nickel-tungsten-sputtering-target

Material: Nickel Tungsten Alloy, 99.9%~99.95%

Composition: Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Nickel Vanadium Sputtering Target, Ni/V

nickel-vanadium-sputtering-target

Material: Nickel Vanadium Alloy, 99.9%

Composition: Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Nickel Zirconium Sputtering Target, Ni/Zr Zr/Ni

Nickel Zirconium Sputtering Target

Material: Nickel Zirconium Alloy, 99.9%

Composition: Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Permalloy Sputtering Target, Ni/Fe/Mo/Mn

permalloy-sputtering-target

Material: Permalloy, 99.9%~99.999%

Composition: Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Chromium Cobalt Nickel HEA Sputtering Target, Co/Cr/Ni

Chromium Cobalt Nickel HEA Sputtering Target

Material: Chromium Cobalt Nickel High-Entropy Alloy

Composition: Can be Customized, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Cobalt Chromium Iron Nickel Aluminum HEA Sputtering Target, Co/Cr/Fe/Ni/Al

Cobalt Chromium Iron Nickel Aluminum HEA Sputtering Target

Material: Cobalt Chromium Iron Nickel Aluminum High-Entropy Alloy

Composition: Can be Customized, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium Recommended

Cobalt Chromium Iron Nickel Manganese HEA Sputtering Target, Co/Cr/Fe/Ni/Mn

Cobalt Chromium Iron Nickel Manganese HEA Sputtering Target

Material: Cobalt Chromium Iron Nickel Manganese High-Entropy Alloy

Composition: Can be Customized, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Cobalt Nickel Vanadium HEA Sputtering Target, Co/Ni/V

cobalt-nickel-vanadium-hea-sputtering-target

Material: Cobalt Nickel Vanadium High-Entropy Alloy

Composition: Can be Customized, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium Recommended

Inconel 600 Sputtering Targets, Ni/Cr/Fe

Inconel 600 Sputtering Targets

Material: Inconel 600 Alloy

Composition: Can be Customized, 99.9%~99.999%

Properties: 8.5g/cc Density, 1,395℃ Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Stainless Steel Sputtering Target

Stainless Steel Sputtering Target

Material: Stainless Steel

Composition: Can be Customized, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Nickel Antimonide Sputtering Target, NiSb

Nickel Antimonide Sputtering Target, NiSb

Material: Nickel Antimonide

Composition: Can be Customized, 99.9%~99.999%

Properties: 8.56g/cc Density, 1,102℃ Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Copper Manganese Nickel Sputtering Target, CuMnNi

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Material: Copper Manganese Nickel Alloy

Composition: Can be Customized, 99.9%~99.999%

Properties: 8.4g/cc Density, ≈960~1,020℃ Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium Recommended

Nickel Gallium Sputtering Target, c

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Material: Nickel Gallium Alloy

Composition: Can be Customized, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium Recommended

Nickel Oxide Sputtering Target, NiO

nickel-oxide-sputtering-target-nio

Material: Nickel Oxide, 99.9%

Properties: Green, 1,955 °CM.P., 6.67g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium, Elastomer

Lanthanum Nickel Oxide Sputtering Target, LaNiO3

lanthanum-nickel-oxide-sputtering-target-lanio3

Material: Lanthanum Nickel Oxide, 99.9%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium, Elastomer

Nickel Silicide Sputtering Target, NiSi2

Nickel Silicide Sputtering Target, NiSi2

Material: Nickel Silicide, 99.9%

Properties: 1,255°C M.P, 7.4g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium, Elastomer

Nickel Boride Sputtering Target, Ni2B

Nickel Boride Sputtering Target, Ni2B

Material: Nickel Boride, 99.5%

Properties: ≈1,125°C M.P., 7.9g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium, Elastomer

Nickel Telluride Sputtering Target, NiTe

nickel-telluride-sputtering-target-nite

Material: Nickel Telluride, 99.5%

Properties: 7.3g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium, Elastomer

Nickel Sulfide Sputtering Target, NiS

Nickel Sulfide Sputtering Target, NiS

Material: Nickel Sulfide, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium Recommended

Lithium Nickel Oxide Sputtering Target, LiNiO2

Lithium Nickel Oxide Sputtering Target, LiNiO2

Material: Lithium Nickel Oxide, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium Recommended

Lithium Nickel Cobalt Oxide Sputtering Target, LNCO

lithium-nickel-cobalt-oxide-sputtering-target-lnco

Material: Lithium Nickel Cobalt Oxide

Purity: LiNi(1-x)CoxO2 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Nickel Ferrite Sputtering Target, NiFe2O4

Nickel Ferrite Sputtering Target, NiFe2O4

Material: Nickel Ferrite, 99.9%~99.999%

Density: 5.4g/cc

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Neodymium Nickel Oxide Sputtering Target, NdNiO3

neodymium-nickel-oxide-sputtering-target-ndnio3

Material: Neodymium Nickel Oxide, 99.9%~99.999%

Density: 7.55g/cc

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium Recommended

Samarium Nickel Oxide Sputtering Target, SmNiO3

samarium-nickel-oxide-sputtering-target-smnio3

Material: Samarium Nickel Oxide, 99.9%~99.999%

Properties: 7.79g/cc Density, 257.05M.W.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium Recommended

Praseodymium Nickel Oxide Sputtering Target, PrNiO

Praseodymium Nickel Oxide Sputtering Target, PrNiO

Material: Praseodymium Nickel Oxide, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium or Elastomer Recommended

Europium Nickel Oxide Sputtering Target, EuNiO3

europium-nickel-oxide-sputtering-target-eunio3

Material: Europium Nickel Oxide, 99.9%~99.999%

Density: 7.57g/cc

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium or Elastomer Recommended

Description

Nickel and Nickel-based Sputtering Targets are fundamental elements in thin film deposition processes, particularly in physical vapor deposition (PVD) techniques like magnetron sputtering. These targets, composed of high-purity nickel or nickel alloys, play indispensable roles across diverse industries, including semiconductor manufacturing for ICs and transistors, flat panel displays, solar cell production, magnetic storage media, decorative coatings, optical devices, wear and corrosion protection in aerospace and automotive applications, and biomedical devices such as orthopedic implants and surgical instruments. With their versatility and reliability, nickel sputtering targets contribute to advancements in electronics, energy, materials science, and healthcare, meeting the stringent requirements of modern technology and industry demands. Nickel is a resilient and lustrous silvery-white metal abundant in the Earth’s core. Nickel boasts a density of 8.91g/cc and a melting point of 1,453°C, with a vapor pressure of 10-4 Torr at 1,262°C. It is renowned for its malleability, ductility, and ferromagnetism. In vacuum environments, nickel finds utility in forming decorative coatings on ceramic surfaces and solder layers in circuit device fabrication. Furthermore, its propensity to be sputtered allows for the creation of layers vital in the manufacture of magnetic storage media, fuel cells, and sensors.MetalsTek’s Nickel Sputtering Targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film deposition materials with the highest possible density and smallest possible average grain sizes.

Nickel (Ni) Specifications

Material Type

Nickel

Z Ratio

0.331

Symbol

Ni

E-Beam

Excellent

Atomic Weight

58.6934

Thermal Evaporation Techniques

Boat: W

Atomic Number

28

Crucible: Al2O3

Appearance

Lustrous, Metallic, Silvery Tinge

E-Beam Crucible Liner Material

FABMATE®, Copper

Thermal Conductivity

91 W/m.K

Temp. (°C) for Given Vap. Press. (Torr)

10-8: 927

Melting Point

1,453 °C

10-6: 1,072

Coefficient of Thermal Expansion

13.4 x 10-6/K

10-4: 1,262

Theoretical Density

8.91 g/cc

Comments

Alloys with W/Ta/Mo. Smooth adherent films.

Ferromagnetic

Magnetic Material

Suggested QCM Crystal

Alloy Crystal: 750-1002-G10

Applications of Nickle Sputtering Targets

Nickel and Nickel-based Sputtering Targets are essential components in thin film deposition processes, particularly in physical vapor deposition (PVD) techniques such as magnetron sputtering. These targets, typically made of high-purity nickel or nickel alloys, are used to deposit thin films of nickel onto substrates in a controlled manner.

 

  1. Semiconductor Manufacturing: Nickel sputtering targets are commonly used in the fabrication of semiconductor devices, including integrated circuits (ICs), transistors, and diodes. These targets are employed for metallization layers, interconnects, and barrier films in semiconductor processing.
  2. Flat Panel Displays: Nickel-based sputtering targets find applications in the production of flat panel displays, including liquid crystal displays (LCDs), organic light-emitting diode (OLED) displays, and thin-film transistor (TFT) arrays. Nickel films are used for electrode layers, reflective coatings, and barrier films in display technologies.
  3. Solar Cells: Nickel sputtering targets are utilized in the manufacture of thin-film solar cells, including cadmium telluride (CdTe), copper indium gallium selenide (CIGS), and amorphous silicon (a-Si) solar cells. Nickel films serve as back contacts, electrode grids, and diffusion barriers in solar cell architectures.
  4. Magnetic Storage Media: Nickel sputtering targets are essential for the production of magnetic storage media, including hard disk drives (HDDs) and magnetic tapes. Nickel films are used as recording layers, magnetic domains, and protective coatings in data storage devices.
  5. Decorative Coatings: Nickel and nickel-based alloy targets are employed for decorative coatings in automotive, architectural, and consumer applications. Nickel films provide aesthetic finishes, corrosion resistance, and wear protection on surfaces such as automotive trim, door handles, and bathroom fixtures.
  6. Optical Coatings: Nickel sputtering targets are used in the deposition of optical coatings for lenses, mirrors, and filters in various optical devices and systems. Nickel films enhance reflectivity, transmission, and durability in optical components used in lasers, cameras, and spectroscopy.
  7. Wear and Corrosion Protection: Nickel and nickel-based alloy targets are utilized for wear and corrosion protection in aerospace, automotive, and marine applications. Nickel films serve as protective coatings on metal substrates to enhance durability, longevity, and performance in harsh environments.
  8. Biomedical Applications: Nickel sputtering targets find applications in biomedical devices and implants, including orthopedic implants, dental prosthetics, and surgical instruments. Nickel films provide biocompatible coatings, corrosion resistance, and mechanical properties suitable for medical applications.

Nickel and Nickel-based Sputtering Targets play crucial roles in various industries, including semiconductor manufacturing, display technology, solar energy, magnetic storage, decorative coatings, optics, wear protection, and biomedical applications. As a manufacturer and supplier of deposition materials, MetalsTek offers high-quality nickel targets tailored to the specific requirements of our customers across diverse applications and industries.

Packaging

Our Nickel and Nickel-based Sputtering Targets are clearly labeled externally to ensure efficient identification and quality control. We take great care to prevent any damage during storage or transportation.

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Attach a Drawing
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