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Sputtering Targets

Find a sputtering target by material, then define the purity, size, target geometry and backing requirements for your process.

Browse the existing target pages below, or send your drawing and cathode requirements for review.

Sputtering Targets for Precision Thin Film Technology

Find an existing sputtering target by material, then confirm the specified composition, purity, geometry, backing and bonding requirements for your deposition system. Use the product directory below or send a drawing for review.

Featured Target Materials

Start with these material and service examples. They are quick entry points, not the complete target directory; use Browse All Sputtering Targets below for the full set of linked product pages.

Metal Targets

Start with the target material, then confirm grade, purity, form and dimensions on the product page.

Tungsten, Molybdenum, Tantalum, Niobium

Oxide & Ceramic Targets

Choose the composition required by the film and process; material-specific options must be checked before quotation.

Indium oxide / ITO options, Titanium oxide options

Other Compound & Alloy Targets

For a specified compound or alloy, send the required composition and process conditions for review.

Titanium nitride, Potassium niobate

Backing Plates & Bonding

Confirm whether the target needs a backing plate or bonding service, especially for an existing cathode assembly.

Target bonding service, OFHC copper backing plates

Browse All Sputtering Targets

potassium_niobate_sputtering_target-removebg-preview-1
Potassium Niobate Target
strontium-sputtering-target
Strontium Sputtering Target
Titanium Nitride Sputtering Target
Titanium Nitride Target
Zinc Sputtering Target
Zinc Target

Target Selection Checklist

Choose the target from the required film and process specification, then provide the details that determine fit and quotation.

  • Material: element, alloy or compound; grade, composition, purity and critical impurity limits. For compound or ceramic targets, include required stoichiometry, phase and density when specified by your process.
  • Geometry: planar or rotary form, drawing, dimensions, tolerances and cathode interface.
  • Assembly: backing plate material and bonding requirement, if applicable.
  • Process: gas environment, power mode and relevant thermal conditions for engineering review.
  • Order: quantity, documentation and destination.

For a process explanation and a specification checklist, read What Is a Sputtering Target? The target and final film must be validated for the actual deposition system.

Related Resources

Selected technical articles for target material and process decisions.

What Is a Sputtering Target? Process and Selection Guide

How sputtering works and which material, geometry and backing details belong in a target RFQ.

Read More

Metallic Sn–Sb vs ATO Ceramic Target

A material-route comparison for antimony-containing oxide thin films.

Read More

Amorphous Carbon vs Graphite Targets

Engineering considerations for carbon-target selection in DLC-related processes.

Read More

Indium Zinc Oxide Sputtering Target (IZO)

A compound-target example for transparent conductor applications.

Read More

Request a Target Quote

Send the required material or composition, purity or grade, drawing or target dimensions, quantity, and deposition application. Include the cathode model, backing-plate material and bonding or rebonding requirements when applicable. Geometry and manufacturability are reviewed for the selected material.

Request a Quote

Tell us what you need. A drawing or specification will help us review your project more efficiently.
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