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Iron Sputtering Target

MetalsTek Engineering’s dedication to innovation ensures the continuous development and enhancement of its Iron Sputtering Targets product line.

Iron Sputtering Target Product List

Iron Sputtering Target, Fe

Iron Sputtering Target, Fe

Material: Iron, 99.9%~99.95%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Iron Oxide Sputtering Target, Fe3O4

Iron Oxide Sputtering Target, Fe3O4

Material: Iron Oxide, 99.9%

Properties: ≈1,538°C M.P., 5.18g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium, Elastomer

Iron Oxide Sputtering Target, Fe2O3

Iron Oxide Sputtering Target, Fe2O3

Material: Iron Oxide, 99.9%

Properties: ≈1,565°C M.P., 5.24g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Bonding: Indium, Elastomer

Cobalt Iron Sputtering Target, Co/Fe

Cobalt Iron Sputtering Target

Material: Cobalt Iron, 99.9%~99.95%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Iron Aluminum Sputtering Target, Fe/Al

Iron Aluminum Sputtering Target

Material: Iron Aluminum, 99.9%~99.999%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Iron Chromium Sputtering Target, Fe/Cr

Iron Chromium Sputtering Target

Material: Iron Chromium, 99.9%~99.95%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Iron Manganese Sputtering Target, Fe/Mn

iron-manganese-sputtering-target

Material: Iron Manganese, 99.9%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Iron Nickel Sputtering Target, Fe/Ni Ni/Fe

iron-nickel-sputtering-target

Material: Iron Nickel, 99.9%~99.99%

Composition: Can be Customized

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Applications
  • Magnetic Devices: Used in the production of magnetic thin films for sensors, memory devices, and read/write heads.
  • Semiconductor Manufacturing: Ideal for semiconductor fabrication processes, including the deposition of thin films for integrated circuits.
  • Optical Coatings: Employed in the creation of optical coatings for lenses, mirrors, and filters.
  • Surface Engineering: Utilized to modify surface properties, enhance wear resistance, and reduce friction in various engineering applications.
  • Research and Development: Essential for R&D projects involving thin-film deposition and material science studies.

Iron Carbide Sputtering Target, Fe3C

Iron Carbide Sputtering Target, Fe3C

Material: Iron Carbide, 99.5%

Properties: ≈1,505°C M.P., 7.7g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Iron Nitride Sputtering Target, FeN4

iron-nitride-sputtering-target-fen4

Material: Iron Nitride, 99.5%

Properties: ≈1,473°C M.P., 6.77g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Iron Sulfide Sputtering Target, FeS

Iron Sulfide Sputtering Target, FeS

Material: Iron Sulfide, 99.9%

Properties: ≈1,194°C M.P., 4.84g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Iron Boride Sputtering Target, FeB

Iron Boride Sputtering Target, FeB

Material: Iron Sulfide, 99.5%

Properties: 1,389°C M.P., 7.3g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Iron Silicon Sputtering Target, FeSi2

iron-silicon-sputtering-target-fesi2

Material: Iron Silicon, 99.9%~99.99%

Properties: 1,220°C M.P., 4.74g/cc Density

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤14” * Length≤32”

Description

Iron Sputtering Targets are essential components used in thin film deposition processes, particularly in the production of magnetic thin films. These targets are available in various purities, sizes, and thicknesses to meet specific application requirements. Iron sputtering targets play a crucial role in creating coatings known for their magnetic properties, making them indispensable in industries requiring precise control over film deposition for applications like semiconductor manufacturing, display technologies, LED production, and more.

Iron is a widely used metal with a metallic-gray color. It is ductile, ferromagnetic, and oxidizes easily when exposed to oxygen. It has a melting point of 1,535°C, a density of 7.86 g/cc, and a vapor pressure of 10-4 Torr at 1,180°C. Iron is used in various applications, such as tools, automobiles, and machinery. By combining it with carbon, we can create steel, which is a crucial material in the construction and automotive industries. Iron also plays a vital biological role in facilitating oxygen transport in blood. In manufacturing processes, it is evaporated under vacuum conditions to create layers for semiconductor production, magnetic storage media, fuel cells, and other applications.

Iron Specifications

Material Type

Iron

Coefficient of Thermal Expansion

11.8 x 10-6/K

Symbol

Fe

Theoretical Density

7.86g/cc

Atomic Weight

55.845

Ferromagnetic

Magnetic Material

Atomic Number

26

Z Ratio

0.349

Appearance

Lustrous, Metallic, Grayish Tinge

Sputter

DC

Thermal Conductivity

80 W/m.K

Max Power Density

50 Watts/Square Inch

Melting Point

1,535°C

Comments

Attacks W. Films hard, smooth. Preheat gently to outgas.

Other Iron Based Sputtering Target

Applications of Iron Sputtering Targets

  1. Magnetic Thin Films:Used in the deposition of magnetic thin films for applications requiring magnetic properties.
  2. Semiconductor Industry: Essential for thin film deposition in semiconductor manufacturing processes.
  3. Display Technologies: Utilized in flat panel displays and LED production for high-quality film coatings.
  4. Decorative Coatings:Applied in creating decorative coatings with specific magnetic characteristics.
  5. Industrial Applications:Found in various industrial processes requiring controlled thin film deposition for specialized functionalities.

Iron Sputtering Targets are versatile materials crucial for producing magnetic thin films with tailored properties to meet the demands of industries like semiconductors, displays, and industrial applications.

Packaging

Our Iron Sputtering Targets are clearly labeled externally to ensure efficient identification and quality control. We take great care to prevent any damage during storage or transportation.

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Iron Evaporation Materials Product List

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