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Material: High-Purity Graphite (Carbon, C)
Purity: ≥99.9% (up to 99.99% available)
Form: Plate / Bar / Rod / Customized Machined Shapes
Size: Customized Dimensions
Applications: Semiconductor Processing, Vacuum Furnaces, PVD/CVD Equipment, Heat Shields, Crucibles, High-Temperature Structural Components
Carbon Plates and Carbon Bars are essential bulk materials widely used in semiconductor, vacuum, and high-temperature industrial applications. Manufactured from high-purity graphite or engineered carbon materials, carbon plates and bars offer excellent thermal stability, chemical inertness, and mechanical reliability, making them suitable for demanding operating environments.
With a sublimation point above 3,600 °C (for graphite) and a typical density range of 1.8–2.2 g/cc, carbon plates and bars exhibit outstanding resistance to extreme temperatures and thermal shock. Their stable crystal structure and anisotropic properties allow precise machining and predictable performance under vacuum, inert, or reactive atmospheres.
Carbon plates and bars are foundational components in:
Semiconductor processing equipment
Vacuum furnaces and thermal systems
PVD / CVD tooling and fixtures
Heat shields, liners, and insulation parts
Crucibles, boats, and high-temperature supports
Wear-resistant and chemically stable structural components
High-purity graphite plates and bars are particularly valued for their low impurity levels, excellent electrical conductivity, and compatibility with ultra-high-vacuum environments. In advanced manufacturing, they are commonly used as wafer handling components, susceptors, heater elements, and precision-machined parts.
Carbon plate and bar products are indispensable across industries such as semiconductors, aerospace, metallurgy, energy systems, optics, and precision manufacturing, providing reliable structural and thermal performance where conventional metals and ceramics are insufficient. Their combination of purity, machinability, and thermal endurance makes carbon plates and bars a critical material platform for next-generation high-temperature and vacuum technologies.
| Material Type | Carbon (Graphite) |
|---|---|
| Symbol | C |
| Atomic Weight | 12.011 |
| Atomic Number | 6 |
| Appearance | Black / Dark Gray, Matte or Crystalline (Graphite) |
| Thermal Conductivity | ~120–200 W/m·K (Graphite, depending on grade) |
| Melting / Sublimation Point | Sublimes at ~3,642 °C |
| Coefficient of Thermal Expansion | ~4–8 × 10⁻⁶ /K (orientation dependent) |
| Theoretical Density | 2.0–2.26 g/cc (graphite density range) |
| Z Ratio | ~1.00 |
| E-Beam | Excellent (stable, clean evaporation) |
Carbon (C) and carbon-based sputtering targets—including graphite, amorphous carbon (DLC), and advanced carbide materials such as SiC, B₄C, WC, TiC, and Mo₂C—are extensively used across modern thin-film industries. Their outstanding thermal stability, chemical inertness, mechanical hardness, and tunable electrical properties make them indispensable materials in contemporary PVD magnetron sputtering processes.
Below is an overview of their primary application fields.
Carbon and carbide sputtering targets are core materials for high-performance thin films used as:
Protective overcoats
Hard and wear-resistant layers
Diamond-like carbon (DLC) coatings
Conductive or resistive films
Barrier and diffusion-blocking layers
These films play a critical role in:
Semiconductor wafer processing
Magnetic and optical storage media
Advanced microelectronics and packaging technologies
In particular, DLC sputtered films provide ultra-smooth, low-friction, and chemically inert surfaces widely used in MEMS devices, storage heads, and precision protective layers.
Carbon-based sputtering targets enable advanced optical coatings for high-energy environments:
B₄C and SiC are widely applied in X-ray optics, synchrotron mirrors, and EUV multilayer systems due to their high absorption coefficients and extreme hardness.
Carbon thin films function as:
Antireflective coatings
Beam-shaping layers
Thermal management films
Their durability under intense photon flux makes them essential in high-energy optical instruments and scientific research facilities.
Carbon sputtering targets—especially DLC and carbide materials—deliver exceptional surface protection against:
Corrosion
Abrasion and wear
High-temperature oxidation
Typical applications include cutting tools, precision dies, bearings, pump components, and engine parts. DLC coatings are especially valued in automotive and industrial systems requiring extremely low friction and long service life.
Carbon-based sputtered films are widely used in high-stress and high-temperature environments, providing:
Thermal barrier layers
Tribological (low-friction) coatings
Structural protection films
EMI shielding layers
SiC, B₄C, and WC sputtering targets are particularly important for aerospace optics, propulsion components, and parts exposed to extreme mechanical and thermal loads.
Carbon materials play multiple critical roles in semiconductor manufacturing:
Amorphous carbon is widely used as a hard mask material in advanced lithography.
Carbon films provide conductive or anti-static layers in device packaging and interconnect structures.
Carbides such as WC, TiC, and SiC serve as:
Diffusion barriers
Gate electrode materials
Interface and contact layers
Components in high-κ dielectric systems
Carbon-based sputtering targets are essential for logic ICs, memory devices, sensors, and power electronics.
Carbon sputtered films enhance:
Electrical conductivity
Thermal stability
Cycling performance of energy devices
Carbide sputtering materials such as Mo₂C and WC also exhibit catalytic properties and are used in:
Hydrogen evolution reactions
Fuel cell components
Electrochemical energy-conversion systems
Thin carbon layers are commonly applied in battery casings, current collectors, and protective surface coatings.
7. Biomedical Engineering & Medical Devices
DLC sputtering targets are widely used to produce coatings with:
Excellent biocompatibility
Low friction coefficients
High chemical inertness
These properties make DLC coatings suitable for medical implants, orthopedic devices, surgical instruments, and precision biomedical components.
Carbide sputtering targets such as B₄C, SiC, and WC exhibit extreme hardness and thermal stability, enabling applications including:
Armor and protective coatings
Neutron absorption films
High-hardness wear layers
Aerospace-grade structural surfaces
Their durability under extreme conditions makes them ideal for defense, aerospace, and heavy-duty industrial systems.
Carbon-based sputtering materials support advanced metallurgical applications, including:
Barrier layers for high-temperature metals
Surface hardening films
Carbide-reinforced composite interfaces
Carbide coatings such as TiC and WC significantly improve wear resistance and mechanical strength of engineered metal surfaces.
Carbon and carbide sputtering targets are increasingly used in catalytic coatings:
WC and Mo₂C thin films act as active catalysts for hydrogenation and reforming reactions.
Carbon layers serve as stable supports for heterogeneous catalysts in chemical manufacturing.
Their thermal stability and controlled surface chemistry make them ideal for harsh reaction environments.