Elastomer Target Bonding is a specialized process used primarily in the semiconductor and materials deposition industries. This method involves attaching a sputtering target to a backing plate using an elastomeric material. The process ensures optimal thermal and electrical conductivity while providing flexibility and durability under varying operational conditions.
Elastomer target bonding utilizes an elastomer, a polymer with elastic properties, to bond the target material to a backing plate. The elastomer acts as an adhesive layer that can absorb mechanical stresses, accommodate thermal expansion differences, and maintain the integrity of the bond during the sputtering process.
Maximum Operating Temperature (°C) | 250 ° C |
Thermal Conductivity (W/mK) | 54 |
Coefficient of Thermal Expansion (K-1) | 2.2 x 10-4 |
Electrical Resistivity (ohm-cm) | 0.0476 |
Bond Coverage | >98% |
Bond Line Thickness | 0.010” ~ 0.025” |
Elastomer target bonding is widely used in various applications, including: