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MetalsTek Engineering is a trusted manufacturer and supplier of Ruthenium Sputtering Targets. We can custom targets according to your requests with short lead times and competitive prices.
Material: Ruthenium
Purity: Ru 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Size Ranges: Disc – Dia. ≤14” * Thick≥1mm; Block – Thick≥1mm * Width ≤12” * Length≤32”
Bonding: Indium, Copper or Elastomer Bonding Recommended
Main Applications: Electronics, Semiconductors, Flat Panel Displays
Ruthenium Sputtering Targets are essential for advanced technologies, including optics, semiconductors, and magnetic storage media. These targets are made with high purity levels, typically 99.9%, to ensure optimal performance in sputtering processes. Ruthenium is a material of great interest for next-generation semiconductors like MRAM (Magnetoresistive Random Access Memory), highlighting its importance in cutting-edge technology applications. Ruthenium sputtering targets play a crucial role in deposition processes, ensuring the creation of precise and high-quality thin films essential for various industrial applications.
Refining: Three-layer electrolytic process
Melting and casting: Electrical resistance furnace – Semi-continuous casting
Grain refinement: Thermomechanical treatment
Cleaning and final packaging: Cleaned for use in vacuum; Protection from environmental contaminants; Protection during shipment
Our Ruthenium Sputtering Targets are vacuum sealed and been clearly labeled externally to ensure efficient identification and quality control. To prevent any damage during storage or transportation, we take great care.