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MetalsTek Engineering is a trusted supplier of Niobium Sputtering Targets, collaborating with global partners to deliver products of the utmost quality at competitive prices.
Out of the standard sizes of targets(Diameter 1″~6″ * Thick. 0.125″&0.25″), we can also manufacture according to your need.
Material: Niobium, Nb
Purity: 99%~99.999%
Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape
Size Range: Disc – Diameter 10~400mm, Thick 2~28mm
Plate – Thick 3~30mm, Width 50~400mm, Length 50~400mm
Other: Purity, Shape, Size, and Bonding Can be Customized
| Material Type | Niobium | Coefficient of Thermal Expansion | 7.3 x 10-6/K |
| Atomic Weight | 92.90638 | Z Ratio | 0.492 |
| Density | 8.3 g/cc | Sputter | DC |
| Color/Appearance | Gray, Metallic | Max Power Density* | 100 Watts/Square Inch |
| Thermal Conductivity | 54 W/m.K | Bonding | Indium, Elastomer |
| Melting Point | 2,468°C | Comments | Attacks W Source |
| Grade | Nb+Ta≥% | Fe | Si | Mo | W | Ti | Cr | Ta | Ni | O | C | H | N |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Nb3 | 99.9 | 20 | 20 | 80 | 100 | 10 | 10 | 1000 | 20 | 250 | 100 | 15 | 150 |
| Nb2 | 99.95 | 10 | 10 | 50 | 50 | 5 | 5 | 500 | 10 | 200 | 50 | 10 | 100 |
| Nb1 | 99.99 | 5 | 5 | 10 | 20 | 1 | 1 | 100 | 1 | 100 | 30 | 10 | 50 |
Material: Niobium Titanium, Nb/Ti
Purity: 99%~99.999%
Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape
Size Range: Disc – Diameter 10~400mm, Thick 2~28mm
Plate – Thick 3~30mm, Width 50~400mm, Length 50~400mm
Other: Purity, Shape, Size, and Bonding Can be Customized
Niobium Titanium Sputtering Target is a material used in sputtering, a technique widely employed in thin-film deposition. Sputtering is ejecting atoms or ions from a solid target material through bombardment with high-energy particles, usually ions. The ejected particles are then deposited onto a substrate to form a thin film.
| Compound Formula | Ti/Nb |
| Appearance | Gray metallic target |
| Molecular Weight | 140.773 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″; Thick.: 0.125″, 0.250″ |
Material: Niobium Alloys, Mo/Nb, W/Nb, Nb3Sn, Co/Nb/Zr, etc.
Purity: 99%~99.999%
Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape
Size Range: Disc – Diameter 10~400mm, Thick 2~28mm
Plate – Thick 3~30mm, Width 50~400mm, Length 50~400mm
Other: Purity, Shape, Size, and Bonding Can be Customized
Material: Niobium Oxide, Nb2O5
Purity: 99.9%, 99.95%
Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape
Standard Size: Diameter 1”, 2”, 3”, 4”, 5”, 6”; Thick 0.125”, 0.25”
Other: Purity, Shape and Size Can be Customized
Material: Niobium Sulfide, NbS
Purity: 99.9%, 99.95%
Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape
Standard Size: Diameter 1”, 2”, 3”, 4”, 5”, 6”; Thick 0.125”, 0.25”
Other: Purity, Shape and Size Can be Customized
Material: Niobium Nitride, NbN
Purity: 99.9%, 99.95%
Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape
Standard Size: Diameter 1”, 2”, 3”, 4”, 5”, 6”; Thick 0.125”, 0.25”
Other: Purity, Shape and Size Can be Customized
Material: Niobium Related
Composition: Mo/Nb, LaNbO3, NbTe2, NbSi2, NbSe2, Nb3Sn, Nb/Ti, NbB2, Co/Nb/Zr, BaNbO3
Purity: 99%~99.99%
Shape: Disc, Plate, Column Targets, Step Targets, or Custom Shape
Standard Size: Diameter 1”, 2”, 3”, 4”, 5”, 6”; Thick 0.125”, 0.25”
Other: Purity, Shape and Size Can be Customized
A Niobium Sputtering target is a specialized material used in sputter deposition. It is commonly employed in thin-film coating applications such as fuel cells, decoration, semiconductors, displays, LEDs, and photovoltaics. Niobium, a transition metal, exhibits properties suitable for use as a sputtering target in various industries.
The niobium sputtering tagets include Nb, Nb2O5, Mo/Nb, W/Nb, LaNbO3, NbTe2, NbSi2, NbSe2, Nb3Sn, NbN, Nb/Ti, NbS, NbB2, Co/Nb/Zr, BaNbO3, and More.
We supply Niobium Sputtering Targets in many shapes: disc, plate, column, rotary targets, and step targets. Target Bonding Service is also available.
When comparing rotatory targets with planar targets, it is evident that rotatory targets offer several advantages. They contain more material, leading to greater utilization, longer production runs, and reduced system downtime, thereby increasing the throughput of the coating equipment. Additionally, the use of higher power densities is enabled due to the even spread of heat build-up over the surface area of the target. This results in increased deposition speed and improved performance during reactive sputtering.
Some key applications of niobium and niobium-related sputtering targets include:
Niobium Sputtering Targets are available in various forms, purities, sizes, and prices, and can be customized according to specific application requirements.
Our Niobium Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.