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MetalsTek Engineering is a leading supplier of high-purity Antimony Sputtering Targets. We offer a range of sputtering targets with short lead times and competitive prices. Our Antimony Sputtering Targets include Sb, Sb2O3, ATO, AlSb, NiSb, PbSb, SnSb, ZnSb, GaSb, Sb/In, Ge-Sb, Sb2S3, Sb2Te3, Bi/Sb, Bi/Sb/Se, Bi/Sb/Te, Sb/In/Sn, GST, Sb2Se2, etc.
Material: Antimony, CAS# 7440-36-0
Purity: 99.999%
Properties: 6.7g/cc Density, 630.63°C/1,167.13°F M.P., 24.4 W/(m⋅K) Thermal Conductivity
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Antimony Oxide, CAS# 1309-64-4
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Antimony-Doped Tin Oxide, CAS# 128221-48-7
Purity: 99.9%~99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Antimony Sulfide, CAS# 1345-04-6
Purity: 99.9%~99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Materials: AlSb, NiSb, PbSb, SnSb, ZnSb, GaSb, Sb/In, Ge-Sb, Bi/Sb, Bi/Sb/Se, Bi/Sb/Te, Sb/In/Sn, GST
Purity: 99.9%~99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Materials: Sb2S3, Sb2Te3, Sb2Se2
Purity: 99.9%~99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Antimony Sputtering Targets are crucial components in physical vapor deposition (PVD) processes, especially in sputtering techniques, used to deposit antimony thin films onto substrate surfaces. These targets are fabricated from high-purity antimony or antimony alloys, with purity levels exceeding 99.9%. The meticulous manufacturing process of these targets involves material selection, melting and casting, and surface preparation to ensure uniform deposition and high-quality thin films. Antimony Sputtering Targets are widely used in industries such as semiconductor fabrication, data storage, optoelectronics, and decorative coatings. They offer numerous benefits, including precise control over film thickness and composition, compatibility with various deposition systems, and cost-effectiveness. These targets enable the production of defect-free thin films with desired properties, contributing to advancements in technology across industries.
Antimony Sputtering Targets find applications in various industries and technologies:
Our Antimony Sputtering Targets are clearly labeled externally to ensure efficient identification and quality control. We take great care to prevent any damage during storage or transportation.