Copper Sputtering Targets

Copper (Cu) and its alloys are cornerstone materials in the domain of vacuum evaporation, offering unmatched electrical and thermal conductivity, pivotal to produce electronic, optical, and coating layers. These materials, particularly favored for their efficacy in creating conductive paths, are instrumental in the manufacturing of electronic circuits, semiconductor devices, and solar panels. The adaptability of copper, available in forms such as pellets, granules, and powders, ensures its compatibility with diverse vacuum evaporation setups, catering to a broad spectrum of industrial applications. Copper has a melting point of 1,083°C, a density of 8.92 g/cc, and is a top-quality conductor of heat and electricity.

Expanding beyond elemental copper, copper-based evaporation materials, including various alloys and compounds like copper oxides (CuO and Cu₂O), enrich the application landscape. These derivatives not only inherit copper’s excellent conductivity but also introduce properties like enhanced corrosion resistance, mechanical strength, and specific optical characteristics. This versatility makes copper-based materials essential for a wide array of applications, from functional coatings in electronics to decorative finishes in architectural elements, showcasing their critical role in advancing material science and thin film technology.