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MetalsTek Engineering a worldwide leading manufacturer and supplier of Manganese Sputtering Targets.
Material: Manganese, Mn
Purity: 99.5%~99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Manganese Copper Alloy
Purity: 99.9%~99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Iron Manganese Alloy
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Manganese Nickel Alloy
Purity: 99.9%~99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Aluminum Manganese Alloy
Purity: 99.9%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”
Bonding: Indium, Elastomer
Material: Manganese Tin Alloy
Purity: 99.9%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Copper Manganese Nickel Alloy
Purity: 99.9%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Ir/Mn, Pt/Mn, Ni/Fe/Mo/Mn, Co/Cr/Fe/Ni/Mn, Mn-Ga, etc.
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Manganese Oxide
Purity: 99.9%
Properties: Green, 5.43g/cc Density, 1,945°C M.P.
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Manganese Oxide
Purity: 99.9%~99.999%
Properties: Black, 4.5g/cc Density, 1,080°C M.P.
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Manganese Sulfide
Purity: 99.9%
Properties: 3.99g/cc Density, 1,610°C M.P.
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Manganese Telluride
Purity: 99.9%~99.95%
Properties: 6g/cc Density, 1,150°C M.P.
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: Manganese Fluoride
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Material: MnO2, MnSe, LaMnO3, La0.67Ca0.33MnO3, Pr0.7Ca0.3MnO3, La(1-x)BaxMnO3, La2CuMnO6, MnCo2O4, SrMnO3, TbMnO3, YMnO3, LiMn2O4, CaMnO3, La0.7Sr0.3MnO3, MnFe2O4, etc.
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”
Block – Thick≥1mm * Width ≤12” * Length≤14”
Bonding: Indium, Elastomer
Manganese Sputtering Targets are crucial materials used in thin film deposition processes for various applications across industries. These targets are designed for sputtering processes, evaporation sources, and deposition materials. Manganese sputtering targets are utilized in diverse industrial areas such as semiconductor manufacturing, optics, wear protection coatings, decorative coatings, and displays. With high purity levels and precise dimensions, these targets ensure quality film deposition for advanced technologies. They play a significant role in enhancing the performance and functionality of electronic components and devices through thin film deposition processes. Manganese Sputtering Targets are essential components that contribute to the advancement of various technological applications requiring precise film coatings and deposition materials.
Material Type | Manganese | E-Beam | Good |
Symbol | Mn | Thermal Evaporation Techniques | Boat: W, Ta, Mo |
Atomic Weight | 54.938045 | Coil: W | |
Atomic Number | 25 | Basket: W | |
Color/Appearance | Silvery Metallic | Crucible: Al2O3 | |
Thermal Conductivity | 7.8 W/m.K | E-Beam Crucible Liner Material | Tungsten |
Melting Point | 1,244°C | Temp. (°C) for Given Vap. Press. (Torr) | 10-8: 507 |
Coefficient of Thermal Expansion | 21.7 x 10-6/K | 10-6: 572 | |
Theoretical Density | ≈7.2 g/cc | 10-4: 647 | |
Z Ratio | 0.377 |
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Manganese Sputtering Targets, composed of pure manganese or manganese alloys, find numerous applications across various industries due to their unique properties and characteristics:
Manganese Sputtering Targets play a crucial role in various technological advancements and industrial applications, ranging from electronics and information storage to energy generation and biomedical engineering. Their versatility, combined with the ability to deposit precise thin films, makes them indispensable in modern manufacturing processes.
Our Manganese Sputtering Targets are clearly labeled externally to ensure efficient identification and quality control. We take great care to prevent any damage during storage or transportation.