Elastomer Target Bonding is a specialized process used primarily in the semiconductor and materials deposition industries. This method involves attaching a sputtering target to a backing plate using an elastomeric material. The process ensures optimal thermal and electrical conductivity while providing flexibility and durability under varying operational conditions.
Elastomer target bonding utilizes an elastomer, a polymer with elastic properties, to bond the target material to a backing plate. The elastomer acts as an adhesive layer that can absorb mechanical stresses, accommodate thermal expansion differences, and maintain the integrity of the bond during the sputtering process.
| Maximum Operating Temperature (°C) | 250 ° C |
| Thermal Conductivity (W/mK) | 54 |
| Coefficient of Thermal Expansion (K-1) | 2.2 x 10-4 |
| Electrical Resistivity (ohm-cm) | 0.0476 |
| Bond Coverage | >98% |
| Bond Line Thickness | 0.010” ~ 0.025” |
Elastomer target bonding is widely used in various applications, including: