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MetalsTek Engineering is a trusted supplier of high-quality Tantalum Compounds, such as Tantalum Nitride, Tantalum Sulfide, and Tantalum Silicide, contributing to advancing industries that rely on cutting-edge materials.
Purity: 99.5% Min
Density: 13.7 g/cc
Melting Point: 3,090 °C
Conductivity: 0.000074 O (Mho/Meter) x 10
Crystal Structure: Hexagonal
Features: High Hardness, Conductivity, High Melting Point, Chemical Inertness
Electronics and Semiconductors: TaN is often used as a barrier material in the production of integrated circuits and semiconductor devices. It helps prevent the diffusion of metal atoms between different layers, improving the reliability and performance of electronic components.
Thin Film Coatings: TaN is applied as a thin film coating in applications such as hard coatings on cutting tools, providing wear resistance and durability.
Optical Coatings: In optics, tantalum nitride coatings can be used for their optical properties, including anti-reflective coatings on lenses and other optical elements.
Solar Cells: TaN is utilized in the fabrication of thin-film solar cells, contributing to their efficiency and durability.
Purity: 99.9% Min
Density: 6.86 g/cc
Melting Point: >3,000 °C
Particle Size: 100 Mesh, 200 Mesh, 325 Mesh, or Customized
Catalysis: TaS has catalytic properties, and it is employed in certain catalytic reactions, including those relevant to chemical processes and industrial applications.
Electronics: Tantalum sulfide compounds, depending on their specific form, can exhibit interesting electronic properties. Some forms of TaS have been studied for their potential use in electronic devices and as components in certain types of batteries.
Superconductivity Research: Certain tantalum sulfide compounds are explored in the field of superconductivity research. They exhibit interesting properties that make them relevant for understanding and developing superconducting materials.
Lubricants: Tantalum sulfide can be used as a solid lubricant in some applications, where its lubricating properties contribute to reducing friction and wear.
Purity: >99.5%
Composition: Si 22.5~23.7%, O≤0.50%, C≤0.50%
Density: 9.14 g/cc
Melting Point: 2,200℃
Particle Size: 10~60μm, 45~150μm (D50)
Fluidity: 12 s/50g
Application: Thermal Spraying, Ceramic, Gas Turbine Engines, Gas Burners
Tantalum has various compound, such as Tantalum Pentoxide, Tantalum Carbide, Tantalum Nitride, Tantalum Sulfide, Tantalum Chloride, Tantalum Telluride, Tantalum Diselenide, and more. These examples highlight the diversity of Tantalum Compounds and their applications in electronics, materials science, catalysis, and other fields. Each compound possesses specific properties that make it suitable for particular uses.
Tantalum Nitride and Tantalum Sulfide are two distinct chemical compounds with different properties and applications. Tantalum Nitride is a hard material used in thin film applications, resistors, and gate electrodes, while Tantalum Sulfide is a layered semiconductor with potential applications in memory devices.