Magnesium Sputtering Target

MetalsTek Engineering is a worldwide manufacturer and supplier of Magnesium and Magnesium-based Sputtering Targets. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in solar cells, semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Magnesium Sputtering Target, Mg

Magnesium Sputtering Target, Mg

Material: Magnesium

Purity: 99.9%~99.99%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Aluminum Magnesium Sputtering Target, Al/Mg

Aluminum Magnesium Sputtering Target

Material: Aluminum Magnesium Alloy

Purity: 99.9%~99.9995%

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Magnesium Oxide Sputtering Target, MgO

Magnesium Oxide Sputtering Target, MgO

Material: Magnesium Oxide 

Purity: 99.9%~99.99%

Properties: 3.58g/cc Density, 2,852 °C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Magnesium Fluoride Sputtering Target, MgF2

magnesium-fluoride-sputtering-target-mgf2

Material: Magnesium Fluoride 

Purity: 99.9%

Properties: ≈3.15g/cc Density, 1,263 °C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Magnesium Sulfide Sputtering Target, MgS

magnesium-sulfide-sputtering-target-mgs

Material: Magnesium Sulfide 

Purity: 99.9%

Properties: 2.84g/cc Density, ≈2,000 °C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Magnesium Silicide Sputtering Target, Mg2Si

magnesium-silicide-sputtering-target-mg2si

Material: Magnesium Silicide 

Purity: 99.9%

Properties: 1.99g/cc Density, 1,102 °C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Magnesium Diboride Sputtering Target, MgB2

Magnesium Diboride Sputtering Target, MgB2

Material: Magnesium Diboride 

Purity: 99.9%

Properties: 2.57g/cc Density, 830 °C M.P.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Sizes: Disc – Dia. 1”~14” * Thick 0.125” / 0.25”

      Block – Thick≥1mm * Width ≤12” * Length≤14”

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Zinc Oxide doped with Magnesium Sputtering Target, ZnMgO

Zinc Oxide doped with Magnesium Sputtering Target, ZnMgO

Material: Magnesium Diboride 

Purity: 99.9% ~ 99.999%.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Magnesium Zinc Oxide Sputtering Target, Mg(1-x)ZnxO

Zinc Oxide doped with Magnesium Sputtering Target, ZnMgO

Material: Magnesium Diboride 

Purity: 99.9% ~ 99.999%.

Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Standard Size: Dia.1”, 2”, 3”, 4”, 5”, 6”; Thick. 0.125”, 0.25”

Bonding: Indium, Elastomer

Description

Magnesium is a grey-white alkaline earth metal that has a melting point of 649°C, density of 1.74 g/cc, and vapor pressure of 10-4 Torr at 327°C. Despite being flammable, it is a versatile material that is extensively used in various industries. Magnesium is an essential element required for regulating nerve function, blood pressure, and nutrient levels in the human body, making it vital for life. Due to its lightweight and high strength-to-weight ratio, magnesium is widely employed in aircraft components, engine casings, laptops, cell phones, and cameras. Additionally, magnesium and its alloys are evaporated under vacuum conditions to produce magnetic and optical storage media, semiconductors, and other technological applications, highlighting its significance in various industries.

Magnesium(Mg) Specifications

Material Type

Magnesium

Thermal Evaporation Techniques

Boat: W, Mo, Ta, Cb

Symbol

Mg

Coil: W

Atomic Weight

24.305

Basket: W

Atomic Number

12

Crucible: Al2O3

Appearance

Silvery White, Metallic

E-Beam Crucible Liner Material

FABMATE®, Graphite, Tungsten

Thermal Conductivity

160 W/m.K

Temp. (°C) for Given Vap. Press. (Torr)

10-8: 185

Melting Point

649 °C

10-6: 247

Coefficient of Thermal Expansion

8.2 x 10-6/K

10-4: 327

Theoretical Density

1.74 g/cc

UN Number

1869

Z Ratio

1.61

Comments

Extremely high rates possible.

E-Beam

Good

 

 

 

Applications

Magnesium sputtering targets have a wide range of applications across various industries:

  1. Thin-Film Solar Cells: Magnesium sputtering targets are used to deposit the semiconductor layers necessary for thin-film solar cell production, which are more cost-effective and flexible than traditional silicon-based solar cells.
  2. Optical Coatings: In the optics industry, magnesium sputtering targets are employed to deposit thin films for antireflection coatings on lenses and optical filters, enhancing the performance of optical systems by reducing unwanted reflections.
  3. Corrosion Protection: Magnesium thin films deposited using sputtering targets can provide corrosion protection, which is particularly useful in industries like automotive and aerospace where preventing corrosion is critical for component longevity.
  4. Semiconductor Devices: The semiconductor industry relies on magnesium sputtering targets to create thin films for various electronic components, including transistors and integrated circuits. The high purity of these targets ensures the quality and performance of semiconductor devices.
  5. Magnesium Alloys: Researchers and manufacturers use magnesium sputtering targets to develop and produce magnesium alloy coatings for a range of applications. These coatings can improve the mechanical and corrosion-resistant properties of materials.

Packaging

Our Magnesium Sputtering Targets are clearly labeled externally to ensure efficient identification and quality control. We take great care to prevent any damage during storage or transportation.

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